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Tessera to Present at International Symposium on Immersion Lithography Extensions
Tuesday, October 13, 2009 7:52 AM


(Source: Business Wire)trackingTessera Technologies, Inc. (Nasdaq:TSRA) will present at SEMATECH's 6th International Symposium on Immersion Lithography Extensions on the latest in modeling and optical performance for diffractive optical elements (DOEs) in immersion lithography.

 WHO:      James Carriere, Senior Optical Engineer, Tessera                                                                     
                                                                                                                                
 WHAT:     Advances in Modeling and Optical Performance for DOEs Used for Off Axis Illumination (OAI) in Immersion Lithography. 
                                                                                                                                
 WHERE:    6(th) International Symposium on Immersion Lithography Extensions                                                    
           Clarion Congress Hotel Prague                                                                                        
           Freyova 33                                                                                                           
           Prague, Czech Republic                                                                                               
                                                                                                                                
 WHEN:     October 22, 2009                                                                                                     
           4:15pm -- 4:35pm                                                                                                     


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Safe Harbor Statement

This press release contains forward-looking statements, which are made pursuant to the safe harbor provisions of the Private Securities Litigation Reform Act of 1995. Forward-looking statements involve risks and uncertainties that could cause actual results to differ significantly from those projected, particularly with respect to Tessera's participation in the 6th International Symposium on Immersion Lithography Extensions and the subject matter of any Tessera presentation.



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