WHO: James Carriere, Senior Optical Engineer, Tessera WHAT: Advances in Modeling and Optical Performance for DOEs Used for Off Axis Illumination (OAI) in Immersion Lithography. WHERE: 6(th) International Symposium on Immersion Lithography Extensions Clarion Congress Hotel Prague Freyova 33 Prague, Czech Republic WHEN: October 22, 2009 4:15pm -- 4:35pm -------------------------------------------------------------------------------
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This press release contains forward-looking statements, which are made pursuant to the safe harbor provisions of the Private Securities Litigation Reform Act of 1995. Forward-looking statements involve risks and uncertainties that could cause actual results to differ significantly from those projected, particularly with respect to Tessera's participation in the 6th International Symposium on Immersion Lithography Extensions and the subject matter of any Tessera presentation.